Tantalum and Niobium-Based Capacitors

Science, Technology, and Applications

Éditeur :

Springer

Paru le : 2017-10-27

This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode ...
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À propos

Auteur

Éditeur

Collection
n.c

Parution
2017-10-27

Pages
120 pages

EAN papier
9783319678696

Auteur(s) du livre


Yuri P. Freeman is director of advanced research in the Tantalum (Ta) business unit and a member of the Advance Technology Group (ATG) at KEMET Electronics.  The ATG is responsible for KEMET’s technical strategy, which includes cooperation with Universities on fundamental issues in passive electronic components. Yuri P. Freeman received his Ph.D. in physics of the solid state from Kharkov Technical University (KhTU) in Ukraine. Prior to KEMET, he worked as principal scientist at Elitan, the largest producer in the Soviet Union of Ta and Niobium (Nb) capacitors, and at Vishay Sprague in the USA. Simultaneously with working in industry, he taught “Physics of Electronic Components” in the KhTU and now in the Clemson University in the USA. Yuri P. Freeman has published more than 30 papers and received 26 patents in the field of physics and technology of Ta and Nb-based capacitors.

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EAN PDF
9783319678702
Prix
94,94 €
Nombre pages copiables
1
Nombre pages imprimables
12
Taille du fichier
6052 Ko
EAN EPUB
9783319678702
Prix
94,94 €
Nombre pages copiables
1
Nombre pages imprimables
12
Taille du fichier
3103 Ko

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