Atomic Layer Deposition for Semiconductors

Éditeur :

Springer

Paru le : 2013-10-18

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such...
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Éditeur

Collection
n.c

Parution
2013-10-18

Pages
263 pages

EAN papier
9781461480532

Auteur(s) du livre


 Cheol Seong Hwang received M.S. and Ph.D. degrees from Seoul National University, Seoul, Korea, in 1989 and 1993, respectively. In 1993, he joined the Material Science and Engineering Laboratory at the National Institutes of Standards and Technology, Gaithersburg, MD, as a Postdoctoral Research Fellow. He then joined Samsung Electronics Company, Ltd., as a Senior Researcher in 1994. In 1998, Dr. Hwang became a professor in the department of material science and engineering at Seoul National University. He has authored or coauthored more than 380 papers in international peer-reviewed scientific journals, which have been cited more than 7,500 times.Dr. Hwang was a recipient of the Alexander von Humboldt Fellowship Award, the 7th Presidential Young Scientist Award of the Korean government, and Faculty Excellent Award of Air Products, USA.

Caractéristiques détaillées - droits

EAN EPUB
9781461480549
Prix
179,34 €
Nombre pages copiables
2
Nombre pages imprimables
26
Taille du fichier
5345 Ko

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